362 Publications (Page 7 of 15)
2007
Phosphine adsorption on the In-rich InP(001) surface: evidence of surface dative bonds at room temperature.Das, Ujjal⋅Raghavachari, Krishnan⋅Woo, Robyn L and Hicks, RobertLangmuir : the ACS journal of surfaces and colloids, vol. 23, (no. 20), pp. 10109-15, 2007/Sep/25.
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Two methanes are better than one: a density functional theory study of the reactions of [Mo.sub.2][O.sub.y.sup.-] with methaneMayhall, Nicholas and Raghavachari, KrishnanJournal of Physical Chemistry A, vol. 111, (no. 33), pp. 8211, 20070823.
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Two Methanes are Better than One: A Density Functional Theory Study of the Reactions of Mo2Oy-(y= 2−5) with MethaneMayhall, Nicholas J and Raghavachari, KrishnanThe journal of physical chemistry. A, vol. 111, (no. 33), pp. 8217, 2007-Aug-23.
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2006
Addition of NH{sub 3} to Al{sub 3}O{sub 3}{sup -}Wyrwas, Richard⋅Wyrwas, Richard⋅Jarrold, Caroline⋅Jarrold, Caroline⋅Das, Ujjal⋅Das, Ujjal⋅Raghavachari, Krishnan and Raghavachari, KrishnanJournal of Chemical Physics, vol. 124, (no. 20), 2006-05-28.
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Al-H bond formation in hydrated aluminum oxide cluster anions.Das, Ujjal and Raghavachari, KrishnanThe Journal of chemical physics, vol. 124, (no. 2), pp. 021101, 2006/Jan/14.
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Hydrogen-bonding interactions in peptide nucleic acid and deoxyribonucleic acid: a comparative study.Herbert, Holly E⋅Halls, Mathew D⋅Hratchian, Hrant P and Raghavachari, KrishnanThe journal of physical chemistry. B, vol. 110, (no. 7), pp. 3336-43, 2006/Feb/23.
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Phosphine and tertiarybutylphosphine adsorption on the indium-rich InP (001)-(2X4) surfaceWoo, R. L⋅Das, U.⋅Cheng, S. F⋅Chen, G.⋅Raghavachari, Krishnan and Hicks, Robert FSurface Science, vol. 600, (no. 21), pp. 4888-4895, 2006.
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The emergence of collective vibrations in cluster models: quantum chemical study of the methyl-terminated Si(111) surface.Ferguson, Glen A and Raghavachari, KrishnanThe Journal of chemical physics, vol. 125, (no. 15), pp. 154708, 2006/Oct/21.
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2005
Addition of water to Al5O4- determined by anion photoelectron spectroscopy and quantum chemical calculations.Das, Ujjal⋅Raghavachari, Krishnan and Jarrold, Caroline CThe Journal of chemical physics, vol. 122, (no. 1), pp. 14313, 2005/Jan/1.
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Assessment of Gaussian-3 and density-functional theories on the G3/05 test set of experimental energies.Curtiss, Larry A⋅Redfern, Paul C and Raghavachari, KrishnanThe Journal of chemical physics, vol. 123, (no. 12), pp. 124107, 2005/Sep/22.
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Carbon Nanotube Inner Phase Chemistry: The Cl-Exchange SN2 ReactionHalls, Mathew D and Raghavachari, KrishnanNano letters, vol. 5, (no. 10), pp. 1866, 2005-Oct.
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Chlorination of hydrogen-terminated silicon (111) surfacesRivillon, Sandrine⋅Chabal, Yves J⋅Webb, Lauren J⋅Michalak, David J⋅Lewis, Nathan S⋅Halls, Mathew D and Raghavachari, KrishnanJournal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, vol. 23, (no. 4), pp. 1106, 20050700.
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Comparison of nickel-group metal cyanides and acetylides and their anions using anion photoelectron spectroscopy and density functional theory calculations.Chatterjee, Bappaditya⋅Akin, F A⋅Jarrold, Caroline C and Raghavachari, KrishnanThe journal of physical chemistry. A, vol. 109, (no. 31), pp. 6880-6, 2005/Aug/11.
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Hafnium oxide and zirconium oxide atomic layer deposition: initial precursor and potential side-reaction product pathways with H/Si(100)-2 x 1Fenno, Ryan D⋅Halls, Mathew D and Raghavachari, KrishnanThe journal of physical chemistry. B, vol. 109, (no. 11), pp. 4976, 2005-Mar-24.
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Hafnium oxide and zirconium oxide atomic layer deposition: Initial precursor and potential side-reaction product pathways with H/Si-2x1Fenno, Ryan⋅Halls, Mathew and Raghavachari, KrishnanJournal of Physical Chemistry B, vol. 109, (no. 11), pp. 4969, 20050324.
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Hafnium Oxide and Zirconium Oxide Atomic Layer Deposition: Initial Precursor and Potential Side-Reaction Product Pathways with H/Si(100)-2×1Fenno, Ryan D⋅Halls, Mathew D and Raghavachari, KrishnanThe Journal of Physical Chemistry B, vol. 109, (no. 11), pp. 4976, 2005-03-00.
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Probing occupied states of the molecular layer in Au-alkanedithiol-GaAs diodes.Hsu, Julia W⋅Lang, David V⋅West, Kenneth W⋅Loo, Yueh-Lin⋅Halls, Mathew D and Raghavachari, KrishnanThe journal of physical chemistry. B, vol. 109, (no. 12), pp. 5719-23, 2005/Mar/31.
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Structures of Mo2Oy− and Mo2Oy (y=2, 3, and 4) studied by anion photoelectron spectroscopy and density functional theory calculationsYoder, Bruce L⋅Yoder, Bruce⋅Yoder, Bruce L⋅Maze, Joshua T⋅Maze, Joshua T⋅Maze, Joshua T⋅Raghavachari, Krishnan⋅Raghavachari, Krishnan⋅Raghavachari, Krishnan⋅Jarrold, Caroline C⋅Jarrold, Caroline Chick and Jarrold, Caroline ChickThe Journal of chemical physics, vol. 122, (no. 9), pp. 094313, 2005-Mar-01.
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2004
Atomic Layer Deposition Growth Reactions of Al2O3on Si(100)-2×1Halls, Mathew D and Raghavachari, KrishnanThe Journal of Physical Chemistry B, vol. 108, (no. 13), pp. 4062, 2004-04-00.
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Atomic layer deposition growth reactions of Al2O3 on Si -2x1Halls, Matthew and Raghavachari, KrishnanJournal of Physical Chemistry B, vol. 108, (no. 13), pp. 4058, 20040401.
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Importance of steric effects in cluster models of silicon surface chemistry: ONIOM studies of the atomic layer depositionHalls, Mathew and Raghavachari, KrishnanJournal of Physical Chemistry A, vol. 108, (no. 15), pp. 2982, 20040415.
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Importance of Steric Effects in Cluster Models of Silicon Surface Chemistry: ONIOM Studies of the Atomic Layer Deposition (ALD) of Al2O3on H/Si(111)Halls, Mathew D and Raghavachari, KrishnanThe Journal of Physical Chemistry A, vol. 108, (no. 15), pp. 2987, 2004-04-00.
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Infrared intensities of nu-2x1: Effect of O incorporation and agglomerationHalls, Mathew and Raghavachari, KrishnanJournal of Physical Chemistry B, vol. 108, (no. 50), pp. 19388, 20041216.
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Infrared Intensities of ν(Si−H) on H/Si(100)-2×1: Effect of O Incorporation and AgglomerationHalls, Mathew D and Raghavachari, KrishnanThe Journal of Physical Chemistry B, vol. 108, (no. 50), pp. 19391, 2004-12-00.
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Photochemical Stability of Pentacene and a Substituted Pentacene in Solution and in Thin FilmsMaliakal, Ashok⋅Raghavachari, Krishnan⋅Katz, Howard⋅Chandross, Edwin and Siegrist, TheoChemistry of Materials, vol. 16, (no. 24), pp. 4986, 2004-11-00.
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